Ambient temperature polymer modification by in situ phototriggered deprotection and thiol–ene chemistry

Ambient temperature polymer modification by in situ phototriggered deprotection and thiol–ene chemistry† 

Thomas Pauloehrl, Guillaume Delaittre, Martin Bastmeyer and Christopher Barner-Kowollik 
 http://pubs.rsc.org/en/Content/ArticleLanding/2012/PY/c1py00372k

This work describes an efficient way to do post-polymerization unveiling of pendant or terminal thiols and then use them for thiol-ene or thiol-maleimide coupling.  Also, they monitor the deprotection by observing the absorbance of the nitrosobenzaldehyde at 345 nm.  Under their conditions, disulfide formation is minimized.