Tuesday, September 18, 2012

A Step-Wise Approach for Dual Nanoparticle Patterning via Block Copolymer Self-Assembly

Horechyy, A., Nandan, B., Zafeiropoulos, N. E., Formanek, P., Oertel, U., Bigall, N. C., Eychmüller, A. and Stamm, M. (2012), A Step-Wise Approach for Dual Nanoparticle Patterning via Block Copolymer Self-Assembly. Adv. Funct. Mater.. doi: 10.1002/adfm.201201452

This paper outlines a simple step-wise method for making micro-patterned dual nanoparticle thin films. Silver nanoparticles that are coated with polystyrene are mixed with a di-block copolymers that are then annealed to yield microarrays (lamellae in the case of symmetric and cylindrical in the case of asymmetric BCPs) where the silver NPs were localized to only the PS domains. In a second step, a variety of secondary nanoparticles can be added on the surface where they preferentially interact with the vinylpyridine domains.

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